The temperature control accuracy of a vacuum annealing furnace is usually between ± 1 ℃ and ± 3 ℃, depending on the model, purpose, and technical specifications of the equipment.
High precision control: Some advanced vacuum annealing furnaces, such as equipment used for annealing semiconductor materials or precision alloys, can achieve temperature control accuracy of ± 1 ℃ or higher.
General precision control: For annealing treatment of most metal materials and general ceramic materials, the furnace temperature control precision is usually around ± 3 ℃.
Specific example:
The temperature control accuracy of some vacuum annealing furnaces is ± 1 ℃, such as some rare metal tube vacuum annealing furnaces that require extremely high temperature.
Other devices may have a nominal temperature control accuracy of ± 3 ℃, such as vacuum annealing furnaces used for semiconductor wafer annealing.
In addition, the uniformity of furnace temperature is also an important indicator for measuring the performance of vacuum annealing furnaces, usually requiring a temperature range of ≤± 5 ℃ to ≤± 10 ℃ to ensure uniform heating of materials during annealing and avoid the generation of thermal stress or uneven microstructure.
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